关键词: 硅酸锆;薄膜;非水解溶胶-凝胶法;抗腐蚀

Abstract: Zirconium silicate ( ZrSiO4 ) film was prepared via non-hydrolytic sol-gel method ( NHSG ) combining dip coating process using Zirconium propoxide as zirconium source and tetraethyl orthosilicate as silicon source .The effects of precursor concentration and lifting rate on the morphology , microstructure and alkali corrosion resistance of ZrSiO 4 film were investigated by X-ray diffraction ( XRD ) , Fourier transform infrared spectrometer ( FTIR ) , Scanning electron microscopy ( SEM ) and Atomic force microscope ( AFM ) , respectively .The results show that the smooth and dense ZrSiO 4 film without cracking could be coated on the monocrystalline silicon when the precursor concentration is 0 .1 mol/L and the lifting rate is 1 mm/s.Monocrystalline silicon coated ZrSiO 4 film was soaked in 40; NaOH solution for 42 h at 40 ℃, only a relatively small pit corrosion on the surface was found , the mass varies a little with the corrosion time and the mass loss was only 0 .17;, which indicate that the ZrSiO 4 film had good alkali corrosion resistance .

Key words: Zirconium silicate ( ZrSiO4 ) film was prepared via non-hydrolytic sol-gel method ( NHSG ) combining dip coating process using Zirconium propoxide as zirconium source and tetraethyl orthosilicate as silicon source .The effects of precursor concentration and lifting rate on the morphology , microstructure and alkali corrosion resistance of ZrSiO 4 film were investigated by X-ray diffraction ( XRD ) , Fourier transform infrared spectrometer ( FTIR ) , Scanning electron microscopy ( SEM ) and Atomic force microscope ( AFM ) , respectively .The results show that the smooth and dense ZrSiO 4 film without cracking could be coated on the monocrystalline silicon when the precursor concentration is 0 .1 mol/L and the lifting rate is 1 mm/s.Monocrystalline silicon coated ZrSiO 4 film was soaked in 40; NaOH solution for 42 h at 40 ℃, only a relatively small pit corrosion on the surface was found , the mass varies a little with the corrosion time and the mass loss was only 0 .17;, which indicate that the ZrSiO 4 film had good alkali corrosion resistance .