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人工晶体学报 ›› 2021, Vol. 50 ›› Issue (3): 469-476.

• 研究论文 • 上一篇    下一篇

GaN-MOVPE气相自由基反应的量子化学研究

刘国峰, 左然   

  1. 江苏大学能源与动力工程学院,镇江 212013
  • 收稿日期:2021-01-22 出版日期:2021-03-15 发布日期:2021-04-15
  • 通信作者: 左 然,博士,教授。E-mail:rzuo@ujs.edu.cn
  • 作者简介:刘国峰(1995—),男,河北省人,硕士研究生。E-mail:815952562@qq.com
  • 基金资助:
    国家自然科学基金(61474058)

Quantum Chemistry Study on Gas Reactions Involved with Radicals in GaN-MOVPE Process

LIU Guofeng, ZUO Ran   

  1. School of Energy and Power Engineering, Jiangsu University, Zhenjiang 212013, China
  • Received:2021-01-22 Online:2021-03-15 Published:2021-04-15

摘要: 利用量子化学的密度泛函理论(DFT),对TMG/NH3/H2体系中自由基参与的金属有机气相外延(MOVPE)反应进行计算分析,特别针对H、NH2自由基对Ga(CH3)3(简称TMG)热解路径、氢解路径以及加合路径的影响进行研究。通过计算不同反应路径的吉布斯自由能差ΔG和能垒ΔG*/RT,确定了自由基参与的气相反应在不同温度下不同的反应路径。研究发现:当T<683 K时,TMG与NH3反应生成加合物TMG:NH3。当T>683 K时,TMG:NH3重新分解为TMG和NH3。TMG在MOVPE温度下很难直接热解,在H自由基作用下则易热解产生Ga(CH3)2(简称DMG)、GaCH3(简称MMG)和Ga原子。当T<800 K时,TMG与NH3的氨基反应速率大于自由基参与的热解反应,故氨基反应占主导;当T>800 K时,自由基参与的TMG热解反应速率大于氨基反应,故热解反应占主导。氢解反应由于能垒很高,因此可忽略。TMG及其热解产物与NH2自由基反应很容易产生氨基物。氨基物DMGNH2可以与H自由基继续反应,最终生成表面反应前体GaNH2

关键词: GaN, MOVPE, 密度泛函理论, 自由基, 气相反应

Abstract: The gas-phase reactions involved with radicals in the TMG/NH3/H2 system of MOVPE process were studied by the density functional theory (DFT) of quantum chemistry. In particular, the effects of H and NH2radicals on the pyrolysis, hydrogenolysis and adduct paths of Ga(CH3)3 (denoted as TMG) were studied. By calculating of the Gibbs energies ΔG and energy barriers ΔG*/RT of different reaction paths, the roles of radicals on the reaction paths at different temperatures were determined. The study found that when T<683 K, TMG reacts with NH3 to generate TMG:NH3. When T>683 K, TMG:NH3 decomposes back into TMG and NH3. At MOVPE condition TMG is difficult to pyrolyze directly. While with H radicals involved, TMG can be easily pyrolyzed into Ga(CH3)2(denoted as DMG), GaCH3(denoted as MMG) and Ga atom. When T<800 K, the rate of amide reaction between TMG and NH3 is greater than the rate of pyrolysis with H radicals, the reaction is dominated by amide reaction. When T>800 K, the rate of pyrolysis with H radicals is greater than the rate of amide reaction, the reaction is dominated by pyrolysis with H radicals. Since the energy barrier of hydrogenolysis is rather high, the reaction can be ignored. TMG and its pyrolysis products can react with NH2 radicals easily to produce amide DMGNH2. The amides can further react with H radicals and eventually generate GaNH2 as surface reaction precursors.

Key words: GaN, MOVPE, DFT, radical, gas reaction

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