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人工晶体学报 ›› 2024, Vol. 53 ›› Issue (7): 1150-1159.

• 研究论文 • 上一篇    下一篇

ITO/AgNWs/ITO薄膜的制备及其性能研究

杨涛1, 陈彩明1, 黄瑜佳2, 吴少平2, 徐华蕊1, 汪坤喆1, 朱归胜1   

  1. 1.桂林电子科技大学材料科学与工程学院,电子信息材料与器件教育部工程研究中心,广西信息材料重点实验室,桂林 541004;
    2.广西中沛光电科技有限公司,来宾 546100
  • 收稿日期:2024-03-25 出版日期:2024-07-15 发布日期:2024-07-23
  • 通信作者: 朱归胜,教授。E-mail:zhuguisheng@guet.edu.cn
  • 作者简介:杨涛(1998—),男,湖南省人,硕士研究生。E-mail:343710130@qq.com
  • 基金资助:
    国家自然科学基金(62364007,U21A2065);广西科技计划(桂科AA21077018,桂科AD23023013,桂科AB23075218);桂林市科学研究与技术开发计划(20220120-1);电子信息材料与器件教育部工程研究中心重点基金(EIMD-AA202001)

Preparation and Properties of ITO/AgNWs/ITO Films

YANG Tao1, CHEN Caiming1, HUANG Yujia2, WU Shaoping2, XU Huarui1, WANG Kunzhe1, ZHU Guisheng1   

  1. 1. Guangxi Key Laboratory of Information Materials, Engineering Research Center of Electronic Information Materials and Devices, Ministry of Education, School of Materials Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, China;
    2. Guangxi Zhongpei optoelectronic Technology Co., Ltd., Laibin 546100, China
  • Received:2024-03-25 Online:2024-07-15 Published:2024-07-23

摘要: 随着显示面板向超大尺寸、超高清、可触控的方向发展,单一的氧化铟锡(ITO)薄膜难以满足显示器件越来越高的光电性能要求,因此复合导电薄膜得以发展。本文制备了以二维银纳米线(AgNWs)导电网络嵌入ITO薄膜形成的ITO(222)/AgNWs/ITO(400)复合薄膜结构,系统研究了AgNWs添加量和上层ITO薄膜溅射温度对复合薄膜结构与光电性能的影响,AgNWs金属导电网络不仅提升了薄膜的电学性能,还保持了优良的光学性能。结果表明,在旋涂600 μL的AgNWs分散液、上层ITO薄膜的溅射温度为175 ℃时,制备的复合ITO薄膜方阻为7.13 Ω/□,在550 nm处透过率为91.52%,且品质因数为57.82×10-3 Ω-1,实现了超低电阻率和高可见光透过率复合ITO薄膜的制备。

关键词: ITO薄膜, 磁控溅射, AgNWs, 导电网络, 复合薄膜, 光电性能, 溅射温度

Abstract: With the advancement of display panel technology towards ultra-large size, ultra-high-definition and touch control capability, the traditional single indium tin oxide (ITO) film alone struggles to meet the increasingly demanding photoelectric performance requirements of display devices. Consequently, composite conductive films have been developed. This study fabricated an ITO(222)/AgNWs/ITO(400) composite film structure by embedding a two-dimensional silver nanowires (AgNWs) conductive networks into ITO films. The influences of the AgNWs addition and the sputtering temperature of the upper ITO film on the structural and optoelectronic properties of the composite film were systematically investigated. The AgNWs metal conductive networks not only enhance the electrical properties of the composite films but also maintain excellent optical characteristics. The results demonstrate that with a spin-coating of 600 μL AgNWs dispersion and a sputtering temperature of 175 ℃ for the upper ITO film, the fabricated composite ITO film has a sheet resistance of 7.13 Ω/□, an impressive transmittance of 91.52% at 550 nm, and a figure of merit of 57.82×10-3 Ω-1, achieving the preparation of a composite ITO film with ultra-low resistivity and high visible light transmittance.

Key words: ITO film, magnetron sputtering, AgNWs, conductive network, composite film, photoelectric property, sputtering temperature

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