[1] WANG T Y, LI B J, REN N F, et al. Influence of Al/Cu thickness ratio and deposition sequence on photoelectric property of ZnO/Al/Cu/ZnO multilayer film on PET substrate prepared by RF magnetron sputtering[J]. Materials Science in Semiconductor Processing, 2019, 91: 73-80. [2] KIM J H, YER I H. Characterization of ZnO nanowires grown on Ga-doped ZnO transparent conductive thin films: effect of deposition temperature of Ga-doped ZnO thin films[J]. Ceramics International, 2016, 42(2): 3304-3308. [3] PARK Y, NEHM F, MÜLLER-MESKAMP L, et al. Optical display film as flexible and light trapping substrate for organic photovoltaics[J]. Optics Express, 2016, 24(10): A974-A980. [4] GUILLÉN C, HERRERO J. TCO/metal/TCO structures for energy and flexible electronics[J]. Thin Solid Films, 2011, 520(1): 1-17. [5] RAIMONDI D L, KAY E. High resistivity transparent ZnO thin films[J]. Journal of Vacuum Science and Technology, 1970, 7(1): 96-99. [6] MINAMI T, NANTO H, TAKATA S. Highly conductive and transparent aluminum doped zinc oxide thin films prepared by RF magnetron sputtering[J]. Japanese Journal of Applied Physics, 1984, 23(Part 2, No. 1): L280-L282. [7] MINAMI T, NANTO H, TAKATA S. Highly conductive and transparent ZnO thin films prepared by RF magnetron sputtering in an applied external DC magnetic field[J]. Thin Solid Films, 1985, 124(1): 43-47. [8] AGURA H, SUZUKI A, MATSUSHITA T, et al. Low resistivity transparent conducting Al-doped ZnO films prepared by pulsed laser deposition[J]. Thin Solid Films, 2003, 445(2): 263-267. [9] DHAGE S R, BADGUJAR A C. Transparent conducting Al∶ZnO thin films on large area by efficient cylindrical rotating DC magnetron sputtering[J]. Journal of Alloys and Compounds, 2018, 763: 504-511. [10] PARK S M, IKEGAMI T, EBIHARA K. Effects of substrate temperature on the properties of Ga-doped ZnO by pulsed laser deposition[J]. Thin Solid Films, 2006, 513(1/2): 90-94. [11] PARK S H, PARK J B, SONG P K. Characteristics of Al-doped, Ga-doped and In-doped zinc-oxide films as transparent conducting electrodes in organic light-emitting diodes[J]. Current Applied Physics, 2010, 10(3): S488-S490. [12] PRASADA RAO T, SANTHOSH KUMAR M C. Physical properties of Ga-doped ZnO thin films by spray pyrolysis[J]. Journal of Alloys and Compounds, 2010, 506(2): 788-793. [13] DJESSAS K, BOUCHAMA I, GAUFFIER J L, et al. Effects of indium concentration on the properties of In-doped ZnO films: applications to silicon wafer solar cells[J]. Thin Solid Films, 2014, 555: 28-32. [14] LIN M C, CHANG Y J, CHEN M J, et al. Characteristics of Zr-doped ZnO thin films grown by atomic layer deposition[J]. Journal of the Electrochemical Society, 2011, 158(6): D395. [15] SHAO J Z, DONG W W, LI D, et al. Metal-semiconductor transition in Nb-doped ZnO thin films prepared by pulsed laser deposition[J]. Thin Solid Films, 2010, 518(18): 5288-5291. [16] CHANG H P, WANG F H, CHAO J C, et al. Effects of thickness and annealing on the properties of Ti-doped ZnO films by radio frequency magnetron sputtering[J]. Current Applied Physics, 2011, 11(1): S185-S190. [17] LIN S S, HUANG J L, AJGALIK P. The properties of Ti-doped ZnO films deposited by simultaneous RF and DC magnetron sputtering[J]. Surface and Coatings Technology, 2005, 191(2/3): 286-292. [18] LU Y M, CHANG C M, TSAI S I, et al. Improving the conductance of ZnO thin films by doping with Ti[J]. Thin Solid Films, 2004, 447/448: 56-60. [19] WANG F H, CHANG H P, CHAO J C. Improved properties of Ti-doped ZnO thin films by hydrogen plasma treatment[J]. Thin Solid Films, 2011, 519(15): 5178-5182. [20] ELLMER K. Resistivity of polycrystalline zinc oxide films: current status and physical limit[J]. Journal of Physics D: Applied Physics, 2001, 34(21): 3097-3108. [21] CATTIN L, BERNÈDE J C, MORSLI M. Toward indium-free optoelectronic devices: dielectric/metal/dielectric alternative transparent conductive electrode in organic photovoltaic cells[J]. Physica Status Solidi (a), 2013, 210(6): 1047-1061. [22] LEE S Y, KWON Y A, JANG G E. Effect of Ti buffer layer on optical characteristic of Si3N4/SnZnO/AZO/Ag/Ti/ITO multi-layer film[J]. Journal of Electroceramics, 2014, 33(1/2): 121-127. [23] LIU Y, QIAO Y D, NIE C J, et al. High photoelectric performance of Cu-based AZO multilayer films deposited via TiO2 barrier layer and oxygen-containing atmosphere[J]. Ceramics International, 2019, 45(18): 24303-24308. [24] ÖZGÜR Ü, ALIVOV Y I, LIU C, et al. A comprehensive review of ZnO materials and devices[J]. Journal of Applied Physics, 2005, 98(4): 041301. [25] LOHMANN R, ÖSTERSCHULZE E, THOMA K, et al. Analysis of RF-sputtered TiB2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy[J]. Materials Science and Engineering: A, 1991, 139: 259-263. [26] DECREMPS F, PELLICER-PORRES J, SAITTA A M, et al. High-pressure Raman spectroscopy study of wurtzite ZnO[J]. Physical Review B, 2002, 65(9): 092101. [27] MONDAL P, DAS D. Effect of hydrogen in controlling the structural orientation of ZnO∶Ga∶H as transparent conducting oxide films suitable for applications in stacked layer devices[J]. Physical Chemistry Chemical Physics, 2016, 18(30): 20450-20458. [28] MOMOT A, AMINI M N, REEKMANS G, et al. A novel explanation for the increased conductivity in annealed Al-doped ZnO: an insight into migration of aluminum and displacement of zinc[J]. Phys Chem Chem Phys, 2017, 19(40): 27866-27877. [29] WU J, PAN Y K, CHEN L W, et al. Microstructure transformation and interface structure of Co/Pt nano-multilayers prepared by ion beam sputtering deposition (IBSD)[J]. Surface and Coatings Technology, 2004, 176(3): 357-364. [30] MOHANTY B C, JO Y H, YEON D H, et al. Stress-induced anomalous shift of optical band gap in ZnO∶Al thin films[J]. Applied Physics Letters, 2009, 95(6): 062103. [31] LIM J H, PARK S J. Contacts to ZnO[M]//Zinc Oxide Bulk, Thin Films and Nanostructures. Amsterdam: Elsevier, 2006: 267-283. [32] ZHU Y W, ZHANG H Z, SUN X C, et al. Efficient field emission from ZnO nanoneedle arrays[J]. Applied Physics Letters, 2003, 83(1): 144-146. [33] SIVARAMAKRISHNAN K, ALFORD T L. Metallic conductivity and the role of copper in ZnO/Cu/ZnO thin films for flexible electronics[J]. Applied Physics Letters, 2009, 94(5): 052104. |