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JOURNAL OF SYNTHETIC CRYSTALS ›› 2023, Vol. 52 ›› Issue (11): 1980-1988.

• Research Articles • Previous Articles     Next Articles

Growth of High-Quality Centimeter-Size Single-Crystal Graphene on High-Temperature Annealed Cu (111) Substrate

QI Jianhai1,2, CHEN Yang1,2, YUE Yuanyuan3, LYU Bingchen1,2, CHENG Yuang1,2, ZHU Fengqian1,2, JIA Yuping1,2, LI Shaojuan1,2, SUN Xiaojuan1,2, LI Dabing1,2   

  1. 1. State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;
    2. Center of Materials Science and Optoelectronics Engineering, University of the Chinese Academy of Sciences, Beijing 100049, China;
    3. School of Management Science and Information Engineering, Jilin University of Finance and Economics, Changchun 130117, China
  • Received:2023-04-13 Online:2023-11-15 Published:2023-11-17
  • Contact: CHEN Yang, associate researcher. E-mail: cheny@ciomp.ac.cn;SUN Xiaojuan, researcher. E-mail: sunxj@ciomp.ac.cn
  • About author:QI Jianhai (1995—), male, from Jiangsu Province, master. E-mail: 2603591798@qq.com
  • Supported by:
    National Key R&D Program of China (2021YFB3601600); National Natural Science Foundation of China (61827813, 52002368, 62121005, 62074147, 62022081, 61974099); Natural Science Foundation of Jilin Province (20230101345JC, 20230101107JC, 20230508132RC); Youth Innovation Promotion Association of the Chinese Academy of Sciences (Y201945, 2019222)

Abstract: Two-dimensional (2D) graphene has shown great potential of breakthrough of Moore's law limitation due to its atomic thickness in electronic devices. Up to now, chemical vapor deposition (CVD) is a widely applied method for graphene growth due to its low-cost, large-area production, and easy control in layer number. However, the CVD-grown graphene usually suffers from relatively low quality derived from the polycrystalline nature of catalytic metal (e.g., Cu) substrates. Herein, single-crystal Cu (111) substrates were fabricated by a high-temperature annealing process, initial nucleation of graphene on it has been well controlled, and high-quality and centimeter-size single-crystal graphene was achieved. The Cu (111) substrate provides onefold orientation for the graphene growth according to their lattice matching relation, and domain boundaries of neighboring graphene nuclei could stitch together. The as-grown single-crystal graphene has an average sheet resistance of 607.5 Ω · sq-1. Compared to that of grown on the pristine polycrystalline Cu (1 415.7 Ω · sq-1), it shows high electrical conductivity. High-temperature annealing purified the Cu foils, and induced a clean graphene surface with lower roughness. The quality of graphene is further verified by using it in a field-effect transistor (FET), resulting in a maximum switch ratio of 145.5 and carrier mobility of 2.31×103 cm2 · V-1 · s-1. Based on these results, we believe that the single-crystal graphene in present work is also feasible for fabricating other high-performance electronic devices.

Key words: Cu (111), graphene, high-temperature annealing, chemical vapor deposition, field-effect transistor

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