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人工晶体学报 ›› 2025, Vol. 54 ›› Issue (6): 970-978.DOI: 10.16553/j.cnki.issn1000-985x.2024.0274

• 研究论文 • 上一篇    下一篇

侧壁修复提升237 nm AlGaN基Micro-LED光功率密度研究

郝家龙1,2(), 李宏博1,2, 吕顺鹏1,2(), 朱立财1,2, 孙文超1,2, 张若甲1,2, 刘钟旭1,2, 蒋科1,2, 贲建伟1,2, 张山丽1,2(), 孙晓娟1,2, 黎大兵1,2   

  1. 1.中国科学院长春光学精密机械与物理研究所,特种发光科学与技术全国重点实验室,长春 130033
    2.中国科学院大学,北京 100049
  • 收稿日期:2024-11-04 出版日期:2025-06-20 发布日期:2025-06-23
  • 通信作者: 吕顺鹏,博士,研究员。E-mail:lvshunpeng@ciomp.ac.cn; 张山丽,助理研究员。E-mail:zhangshanli@ciomp.ac.cn
  • 作者简介:郝家龙(2000—),男,四川省人,硕士研究生。E-mail:haojialong22@mails.ucas.ac.cn
  • 基金资助:
    国家重点研发计划(2022YFB3605103);国家杰出青年科学基金(62425408);国家自然科学基金青年基金(62204241);吉林省科技发展计划重点研发项目(20240302027GX);吉林省自然科学基金(20230101345JC);中国科学院BR计划(E30122E4M0)

Sidewall Repair Improves Optical Power Density of 237 nm AlGaN-Based Micro-LEDs

HAO Jialong1,2(), LI Hongbo1,2, LYU Shunpeng1,2(), ZHU Licai1,2, SUN Wenchao1,2, ZHANG Ruojia1,2, LIU Zhongxu1,2, JIANG Ke1,2, BEN Jianwei1,2, ZHANG Shanli1,2(), SUN Xiaojuan1,2, LI Dabing1,2   

  1. 1.State Key Laboratory of Luminescence Science and Technology,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China
    2.University of Chinese Academy of Sciences,Beijing 100049,China
  • Received:2024-11-04 Online:2025-06-20 Published:2025-06-23

摘要: AlGaN基深紫外Micro-LED在无掩膜光刻、日盲紫外保密通信等领域具有重要应用前景。然而,侧壁效应和电流拥挤效应严重制约高电流密度下的光功率密度。本研究制备了发光波长237 nm,台面半径分别为12.5、25.0、50.0 μm的深紫外Micro-LED,并系统探究了侧壁修复对不同尺寸和不同阵列化Micro-LED的影响规律。研究发现,使用KOH修复侧壁可有效降低AlGaN基深紫外Micro-LED侧壁缺陷密度,减小反向漏电流密度,同时降低由侧壁缺陷导致的肖特基-里德-霍尔(SRH)非辐射复合。对于单台面器件,器件尺寸越小,最大光功率密度越高,但侧壁效应严重制约着小尺寸器件的光功率密度,导致小尺寸器件在低电流密度下光功率密度最低,侧壁修复后,半径12.5 μm的器件峰值光功率密度提升最多,提升了186%,且在不同电流密度下光功率密度均最高;对于相同发光面积的阵列化器件,侧壁修复后,阵列化程度越高,光功率密度越高,4×4阵列12.5 μm的Micro-LED比半径50.0 μm的器件峰值光功率密度提高了116%,其原因是在保持较低侧壁缺陷的情况下,阵列化可以提高电流密度分布均匀性,进而提高光效。该研究有助于提高Micro-LED的光功率密度,并将推动短波深紫外Micro-LED走向实际应用。

关键词: 侧壁效应; 电流拥挤效应; AlGaN micro-LED; 侧壁修复; 阵列化工程

Abstract: AlGaN-based deep ultraviolet Micro-LEDs have important applications in maskless lithography, deep ultraviolet non-line-of-sight communication and other fields. However, the sidewall effect and current crowding effect seriously restrict the optical power density of Micro-LEDs under high current density. In this work, 237 nm deep ultraviolet Micro-LEDs with mesa radiuses of 12.5, 25.0 and 50.0 μm were prepared, and the effects of sidewall repair on different sized and different arrayed Micro-LEDs were systematically studied. It is revealed that KOH solution effectively reduces the sidewall defect density of AlGaN-based deep ultraviolet Micro-LEDs, and contributes to a lower reverse leakage current density and Shockley-Read-Hall (SRH) non-radiative recombination caused by these sidewall defects. For single mesa devices, a smaller sized device owns a higher maximum optical power density, but the sidewall effect seriously restricts the optical power density of the smaller sized device, resulting in the lowest optical power density of the 12.5 μm sized device at low current density. After sidewall repair, the peak optical power density of the 12.5 μm sized device increases by 186%, and the optical power density is the highest at all current density range. For arrayed devices with an identical mesa area, after the sidewall repair, a bigger matrix contributes to a higher optical power density. The peak optical power density of the 4×4 arrayed 12.5 μm sized Micro-LED increases by 116% compared to the 50 μm sized device. The underlying reason is that a bigger matrix can improve the uniformity of current density distribution and the light efficiency while maintaining low sidewall defects. This study is helpful to improve the optical power density of Micro-LEDs and will promote the practical application of short-wavelength deep ultraviolet Micro-LEDs.

Key words: sidewall effect; current crowding effect; AlGaN micro-LED; sidewall repair; array engineering

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