圆筒式柱面磁控溅射靶的磁场设计与仿真研究

摘要/Abstract

摘要： 为探究一种可实现向心溅射的圆筒式柱面磁控阴极靶,需要对靶装置内的磁场分布进行研究,进一步讨论靶结构参数对其磁场分布的影响规律。本文根据磁控靶的结构与工作原理,利用COMSOL Multiphysics有限元分析软件中AC/DC接口,对靶进行三维模型构建、划分网格和仿真计算。通过改变靶内磁体形状尺寸、磁轭形状以及结构排布,对靶面磁场的分布进行规律探究。最终确定新型圆筒式柱面磁控溅射阴极靶内的磁场结构参数,结果表明结构靶面磁场分布均匀且大小满足溅射要求的磁感应强度(20~50 mT),平行靶面均匀磁场区域达35%~40%左右。通过这类靶磁场结构的研究,为设计优化磁控阴极靶提供依据。

关键词: 磁控溅射, 磁场分布, 圆柱靶, 有限元分析, COMSOL, 结构参数, 真空镀膜, 设计与仿真

Abstract: The cylindrical magnetron sputtering cathode target, playing a key role in many application fields, could be controbally tuned by structure and magnetic field distribution. Otherwise, up to now, it is inadequate for the structure research of this type of target. Herein, this structure was calculated by AC/DC interface in COMSOL Multiphysics, including constructing 3D model, dividing mesh and results analysis. In addition, the distribution law of magnetic field on target surface is determined by the structural parameters of magnets, the shape of the magnetic yoke, and the structural arrangement in the target. The results show that the magnetic filed of the target surface is directly affected by the cross-sectional area of the magnetic ring, the thickness and height of the magnetic yoke. Also, the uniform area of the magnetic field on the target surface is determined by the magnetic yoke gap in the magnetic circuit structure and the shape of the extension arm of the magnetic yoke. Herein, a novel cylindrical magnetron sputtering target is presented, which has a uniformly distributed magnetic field on the target surface and the magnetic induction intensity is 20 mT to 35 mT. In addition, the uniform magnetic field area on the parallel target surface reaches about 35% to 40%. This work pave a way to deeply apply cylindrical magnetron sputtering cathode target into coating process.

Key words: magnetron sputtering, magnetic field distribution, column target, finite element analysis, COMSOL, structural parameter, vacuum coating, design and simulation

中图分类号:

TB43

杨欣蕾, 弥谦, 龚立榕, 周凤琳. 圆筒式柱面磁控溅射靶的磁场设计与仿真研究[J]. 人工晶体学报, 2021, 50(9): 1765-1773.

YANG Xinlei, MI Qian, GONG Lirong, ZHOU Fenglin. Magnetic Field Design and Simulation of Cylindrical Magnetron Sputtering Target[J]. JOURNAL OF SYNTHETIC CRYSTALS, 2021, 50(9): 1765-1773.

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