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Journal of Synthetic Crystals ›› 2026, Vol. 55 ›› Issue (1): 52-57.DOI: 10.16553/j.cnki.issn1000-985x.2025.0159

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Growth and Properties of 4-Inch Fe Doped (010) β -Gallium Oxide Using Vertical Bridgman Method

LI Ming1,2(), YE Haohan1,2, WANG Cheng3, SHEN Dianyu3, WANG Yunxia3, WANG Jiajun3, XIA Ning3, ZHANG Hui1,2(), YANG Deren1,2   

  1. 1. State Key Laboratory of Silicon and Advanced Semiconductor Materials,School of Materials Science and Engineering,Zhejiang University,Hangzhou 310027,China
    2. Institute of Advanced Semiconductors,Hangzhou Global Scientific and Technological Innovation Center,Zhejiang University,Hangzhou 310027,China
    3. Hangzhou Garen Semiconductor Company Limited,Hangzhou 311200,China
  • Received:2025-07-24 Online:2026-01-20 Published:2026-02-05
  • Contact: ZHANG Hui

Abstract: In this study, a self-built vertical Bridgman (VB) system was utilized to grow large-size, high-quality Fe-doped β-Ga2O3 single crystals. Through iterative thermal field optimization via simulation, slightly convex solid-liquid interface and appropriate temperature gradient were achieved. The as-grown crystal was further processed into a high-quality 4-inch (010) oriented semi-insulating substrate. Comprehensive evaluations of crystallinity, surface morphology, and electrical properties were carried out. The substrate exhibits no macroscopic defects such as cracks. Multi-point X-ray rocking curve measurements show full width at half maximum (FWHM) values all below 50″, indicating superior crystalline quality. Surface topography tests reveal a maximum roughness of 0.074 nm, local thickness variation (LTV) below 3.4 μm, total thickness variation (TTV) of 4.157 μm, warp of 5.886 μm, and bow of 1.103 μm, demonstrating excellent processing quality. Moreover, the substrate displays high average resistivity of approximately 7.9×1010 Ω·cm with an in-plane inhomogeneity of about 7.77%, underscoring the effectiveness of VB method in achieving uniform doping distribution and its potential for radio frequency (RF) and microwave device applications.

Key words: Ga2O3; wide-bandgap semiconductor; crystal growth; vertical Bridgman; single crystal substrate; doping

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