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Journal of Synthetic Crystals ›› 2025, Vol. 54 ›› Issue (9): 1534-1546.DOI: 10.16553/j.cnki.issn1000-985x.2025.0053

• Research Articles • Previous Articles     Next Articles

Numerical Simulation for Pipeline Problem of Highly Sb-Doped Czochralski Silicon Single Crystal

LI Xiaochuan1(), MA Sanbao2, ZHOU Fengzi3, REN Yongpeng1, MA Wuxiang2, MEI Haotian2   

  1. 1.Longmen Laboratory,Luoyang 471000,China
    2.MCL Electronic Materials Company Limited,Luoyang 471000,China
    3.School of Physics and Engineering,Henan University of Science and Technology,Luoyang 471000,China
  • Received:2025-03-18 Online:2025-09-20 Published:2025-09-23

Abstract: The pipeline problem due to the facet effect often appears in the growth of <111>-oriented highly Sb-doped silicon single crystal, seriously impacting the quality of silicon wafer, which needs to be solved urgently. In this study, several solutions are provided theoretically for pipeline problem of 8 inch (1 inch=2.54 cm) highly Sb-doped silicon single crystal, and then tested through the simulation with CGSim software. The obtained results indicate that the increase of pulling speed (V) and crystal rotation speed (M) accompanied with the decrease of crucible rotation speed (N) is an effective solution to suppress the facet effect. This solution can improve the shape of solid-liquid interface remarkably, enhance temperature gradient and velocity of flow near the solid-liquid interface, and reduce the thermal stress of crystal. The optimal technical parameters are V=0.7 mm/min, M=17 r/min and N=-7 r/min.

Key words: highly Sb-doped silicon single crystal; pipeline problem; facet effect; numerical simulation

CLC Number: